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Plasma Etching of High-resolution Features in a Fullerene Molecular Resist

Robert D. Allen, J. Manyam, Mark H. Somervell, M. Manickam, J. A. Preece, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.879469

Published: 2011
URI: https://cronfa.swan.ac.uk/Record/cronfa49300
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College: College of Engineering