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A high resolution water soluble fullerene molecular resist for electron beam lithography

X Chen, R E Palmer, A P G Robinson, Richard Palmer Orcid Logo

Nanotechnology, Volume: 19, Issue: 27, Start page: 275308

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Nanotechnology
ISSN: 0957-4484 1361-6528
Published: 2008
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URI: https://cronfa.swan.ac.uk/Record/cronfa49321
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College: College of Engineering
Issue: 27
Start Page: 275308