No Cover Image

Journal article 441 views

A high resolution water soluble fullerene molecular resist for electron beam lithography

X Chen, R E Palmer, A P G Robinson, Richard Palmer Orcid Logo

Nanotechnology, Volume: 19, Issue: 27, Start page: 275308

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Published in: Nanotechnology
ISSN: 0957-4484 1361-6528
Published: 2008
Online Access: Check full text

Tags: Add Tag
No Tags, Be the first to tag this record!
College: Faculty of Science and Engineering
Issue: 27
Start Page: 275308