Journal article 692 views
A high resolution water soluble fullerene molecular resist for electron beam lithography
Nanotechnology, Volume: 19, Issue: 27, Start page: 275308
Swansea University Author: Richard Palmer
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DOI (Published version): 10.1088/0957-4484/19/27/275308
Abstract
A high resolution water soluble fullerene molecular resist for electron beam lithography
Published in: | Nanotechnology |
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ISSN: | 0957-4484 1361-6528 |
Published: |
2008
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URI: | https://cronfa.swan.ac.uk/Record/cronfa49321 |
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2019-03-18T14:32:02.5422301 v2 49321 2019-03-18 A high resolution water soluble fullerene molecular resist for electron beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Nanotechnology 19 27 275308 0957-4484 1361-6528 31 12 2008 2008-12-31 10.1088/0957-4484/19/27/275308 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:32:02.5422301 2019-03-18T14:32:02.3407485 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering X Chen 1 R E Palmer 2 A P G Robinson 3 Richard Palmer 0000-0001-8728-8083 4 |
title |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
spellingShingle |
A high resolution water soluble fullerene molecular resist for electron beam lithography Richard Palmer |
title_short |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
title_full |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
title_fullStr |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
title_full_unstemmed |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
title_sort |
A high resolution water soluble fullerene molecular resist for electron beam lithography |
author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
author |
Richard Palmer |
author2 |
X Chen R E Palmer A P G Robinson Richard Palmer |
format |
Journal article |
container_title |
Nanotechnology |
container_volume |
19 |
container_issue |
27 |
container_start_page |
275308 |
publishDate |
2008 |
institution |
Swansea University |
issn |
0957-4484 1361-6528 |
doi_str_mv |
10.1088/0957-4484/19/27/275308 |
college_str |
Faculty of Science and Engineering |
hierarchytype |
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facultyofscienceandengineering |
hierarchy_top_title |
Faculty of Science and Engineering |
hierarchy_parent_id |
facultyofscienceandengineering |
hierarchy_parent_title |
Faculty of Science and Engineering |
department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
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0 |
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published_date |
2008-12-31T04:00:14Z |
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1763753081197035520 |
score |
11.030581 |