Journal article 692 views
A high resolution water soluble fullerene molecular resist for electron beam lithography
Nanotechnology, Volume: 19, Issue: 27, Start page: 275308
Swansea University Author: Richard Palmer
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DOI (Published version): 10.1088/0957-4484/19/27/275308
Abstract
A high resolution water soluble fullerene molecular resist for electron beam lithography
Published in: | Nanotechnology |
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ISSN: | 0957-4484 1361-6528 |
Published: |
2008
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Online Access: |
Check full text
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URI: | https://cronfa.swan.ac.uk/Record/cronfa49321 |
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College: |
Faculty of Science and Engineering |
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Issue: |
27 |
Start Page: |
275308 |