Chemically amplified molecular resists for e-beam lithography

Journal article 1095 views

F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Richard Palmer

Microelectronic Engineering, Volume: 85, Issue: 5-6, Pages: 764 - 767

Swansea University Author: Richard Palmer

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DOI (Published version): 10.1016/j.mee.2007.12.001

Published in:	Microelectronic Engineering
ISSN:	01679317
Published:	2008
Online Access:	Check full text
URI:	https://cronfa.swan.ac.uk/Record/cronfa49326

College:	Faculty of Science and Engineering
Issue:	5-6
Start Page:	764
End Page:	767