Journal article 1095 views
Chemically amplified molecular resists for e-beam lithography
F.P. Gibbons,
J. Manyam,
S. Diegoli,
M. Manickam,
J.A. Preece,
R.E. Palmer,
A.P.G. Robinson,
Richard Palmer 
Microelectronic Engineering, Volume: 85, Issue: 5-6, Pages: 764 - 767
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/j.mee.2007.12.001
Abstract
Chemically amplified molecular resists for e-beam lithography
| Published in: | Microelectronic Engineering |
|---|---|
| ISSN: | 01679317 |
| Published: |
2008
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49326 |
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2019-03-18T20:01:39Z |
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2019-03-18T20:01:39Z |
| id |
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| recordtype |
SURis |
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2019-03-18T14:32:08.4287609 v2 49326 2019-03-18 Chemically amplified molecular resists for e-beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article Microelectronic Engineering 85 5-6 764 767 01679317 31 12 2008 2008-12-31 10.1016/j.mee.2007.12.001 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:32:08.4287609 2019-03-18T14:32:08.1867172 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering F.P. Gibbons 1 J. Manyam 2 S. Diegoli 3 M. Manickam 4 J.A. Preece 5 R.E. Palmer 6 A.P.G. Robinson 7 Richard Palmer 0000-0001-8728-8083 8 |
| title |
Chemically amplified molecular resists for e-beam lithography |
| spellingShingle |
Chemically amplified molecular resists for e-beam lithography Richard Palmer |
| title_short |
Chemically amplified molecular resists for e-beam lithography |
| title_full |
Chemically amplified molecular resists for e-beam lithography |
| title_fullStr |
Chemically amplified molecular resists for e-beam lithography |
| title_full_unstemmed |
Chemically amplified molecular resists for e-beam lithography |
| title_sort |
Chemically amplified molecular resists for e-beam lithography |
| author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
| author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
| author |
Richard Palmer |
| author2 |
F.P. Gibbons J. Manyam S. Diegoli M. Manickam J.A. Preece R.E. Palmer A.P.G. Robinson Richard Palmer |
| format |
Journal article |
| container_title |
Microelectronic Engineering |
| container_volume |
85 |
| container_issue |
5-6 |
| container_start_page |
764 |
| publishDate |
2008 |
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Swansea University |
| issn |
01679317 |
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10.1016/j.mee.2007.12.001 |
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Faculty of Science and Engineering |
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|
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
| department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
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0 |
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| published_date |
2008-12-31T05:49:24Z |
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1850736812587220992 |
| score |
11.08895 |