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Electron-stimulated reaction of C60 with a model etching gas, SF6

Jean-Marc Coquel, Michael R. C. Hunt, Lidija Šiller, Richard Palmer Orcid Logo

Journal of Applied Physics, Volume: 84, Issue: 8, Pages: 4603 - 4610

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1063/1.368686

Published in: Journal of Applied Physics
ISSN: 0021-8979 1089-7550
Published: 1998
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URI: https://cronfa.swan.ac.uk/Record/cronfa49486
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College: College of Engineering
Issue: 8
Start Page: 4603
End Page: 4610