Journal article 554 views
Electron-stimulated reaction of C60 with a model etching gas, SF6
Jean-Marc Coquel,
Michael R. C. Hunt,
Lidija Šiller,
Richard Palmer 
Journal of Applied Physics, Volume: 84, Issue: 8, Pages: 4603 - 4610
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1063/1.368686
Abstract
Electron-stimulated reaction of C60 with a model etching gas, SF6
| Published in: | Journal of Applied Physics |
|---|---|
| ISSN: | 0021-8979 1089-7550 |
| Published: |
1998
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49486 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
8 |
| Start Page: |
4603 |
| End Page: |
4610 |