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Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma

M. Bale, R. E. Palmer, Richard Palmer Orcid Logo

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume: 17, Issue: 5, Pages: 2467 - 2469

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1116/1.581984

Published in: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
ISSN: 0734-2101 1520-8559
Published: 1999
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URI: https://cronfa.swan.ac.uk/Record/cronfa49475
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College: College of Engineering
Issue: 5
Start Page: 2467
End Page: 2469