Journal article 619 views
Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
M. Bale,
R. E. Palmer,
Richard Palmer 
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume: 17, Issue: 5, Pages: 2467 - 2469
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1116/1.581984
Abstract
Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
| Published in: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
|---|---|
| ISSN: | 0734-2101 1520-8559 |
| Published: |
1999
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49475 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
5 |
| Start Page: |
2467 |
| End Page: |
2469 |