No Cover Image

Journal article 619 views

Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma

M. Bale, R. E. Palmer, Richard Palmer Orcid Logo

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume: 17, Issue: 5, Pages: 2467 - 2469

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Check full text

DOI (Published version): 10.1116/1.581984

Published in: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
ISSN: 0734-2101 1520-8559
Published: 1999
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49475
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:02:00Z
last_indexed 2019-03-18T20:02:00Z
id cronfa49475
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:37:17.3225268</datestamp><bib-version>v2</bib-version><id>49475</id><entry>2019-03-18</entry><title>Reactive ion etching of piezoelectric Pb(ZrxTi1&#x2212;x)O3 in a SF6 plasma</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal>Journal of Vacuum Science &amp;amp; Technology A: Vacuum, Surfaces, and Films</journal><volume>17</volume><journalNumber>5</journalNumber><paginationStart>2467</paginationStart><paginationEnd>2469</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>0734-2101</issnPrint><issnElectronic>1520-8559</issnElectronic><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>1999</publishedYear><publishedDate>1999-12-31</publishedDate><doi>10.1116/1.581984</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:37:17.3225268</lastEdited><Created>2019-03-18T14:37:17.1264502</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>M.</firstname><surname>Bale</surname><order>1</order></author><author><firstname>R. E.</firstname><surname>Palmer</surname><order>2</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>3</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:37:17.3225268 v2 49475 2019-03-18 Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Journal of Vacuum Science &amp; Technology A: Vacuum, Surfaces, and Films 17 5 2467 2469 0734-2101 1520-8559 31 12 1999 1999-12-31 10.1116/1.581984 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:37:17.3225268 2019-03-18T14:37:17.1264502 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering M. Bale 1 R. E. Palmer 2 Richard Palmer 0000-0001-8728-8083 3
title Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
spellingShingle Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
Richard Palmer
title_short Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
title_full Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
title_fullStr Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
title_full_unstemmed Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
title_sort Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 M. Bale
R. E. Palmer
Richard Palmer
format Journal article
container_title Journal of Vacuum Science &amp; Technology A: Vacuum, Surfaces, and Films
container_volume 17
container_issue 5
container_start_page 2467
publishDate 1999
institution Swansea University
issn 0734-2101
1520-8559
doi_str_mv 10.1116/1.581984
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 1999-12-31T04:00:31Z
_version_ 1763753099697061888
score 11.012678