Journal article 505 views
Fabrication of 10-nm Si pillars with self-formed etching masks
Tetsuya Tada,
Toshihiko Kanayama,
Pascal Weibel,
Simon J. Carroll,
Katrin Seeger,
Richard Palmer 
Microelectronic Engineering, Volume: 35, Issue: 1-4, Pages: 293 - 296
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/s0167-9317(96)00129-3
Abstract
Fabrication of 10-nm Si pillars with self-formed etching masks
| Published in: | Microelectronic Engineering |
|---|---|
| ISSN: | 01679317 |
| Published: |
1997
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49506 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
1-4 |
| Start Page: |
293 |
| End Page: |
296 |