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Fabrication of 10-nm Si pillars with self-formed etching masks

Tetsuya Tada, Toshihiko Kanayama, Pascal Weibel, Simon J. Carroll, Katrin Seeger, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 35, Issue: 1-4, Pages: 293 - 296

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Microelectronic Engineering
ISSN: 01679317
Published: 1997
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49506
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College: College of Engineering
Issue: 1-4
Start Page: 293
End Page: 296