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Characterization of the Effects of Base Additives on a Fullerene Chemically Amplified Resist

Robert D. Allen, Jedsada Manyam, Mayandithevar Manickam, Jon A. Preece, Richard Palmer Orcid Logo, Alex P. Robinson

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.846581

Published: 2010
URI: https://cronfa.swan.ac.uk/Record/cronfa49307
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College: College of Engineering