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Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
| Published: |
2008
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49325 |
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| College: |
Faculty of Science and Engineering |
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