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Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M

Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

Published: 2008
URI: https://cronfa.swan.ac.uk/Record/cronfa49325
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spelling 2019-03-18T14:32:07.7343027 v2 49325 2019-03-18 Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Book chapter 31 12 2008 2008-12-31 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:32:07.7343027 2019-03-18T14:32:07.7343027 College of Engineering Engineering Richard Palmer 0000-0001-8728-8083 1
title Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
spellingShingle Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
Richard Palmer
title_short Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
title_full Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
title_fullStr Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
title_full_unstemmed Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
title_sort Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Richard Palmer
format Book chapter
publishDate 2008
institution Swansea University
college_str College of Engineering
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hierarchy_top_title College of Engineering
hierarchy_parent_id collegeofengineering
hierarchy_parent_title College of Engineering
department_str Engineering{{{_:::_}}}College of Engineering{{{_:::_}}}Engineering
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published_date 2008-12-31T04:02:23Z
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