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Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography
| Published: |
1999
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49472 |
| College: |
Faculty of Science and Engineering |
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