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Journal article

A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist / Francis Gibbons, Hasnah M. Zaid, Mayandithevar Manickam, Jon A. Preece, Richard E. Palmer, et al

Swansea University Author: Richard Palmer
Published in Small (2007)

In collection: Faculty of Science and Engineering

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Journal article

Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography / Francis P. Gibbons, Alex P. G. Robinson, Richard E. Palmer, Mayanditheuar Manickam, Jon A. Preece

Swansea University Author: Richard Palmer
Published in Small (2006)

In collection: Faculty of Science and Engineering

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Journal article

Crack growth in the creep-fatigue regime under constrained loading of thin sheet combustor alloys / M.R Bache, R.E Johnston, T.S Cook, B.J Robinson, J.F Matlik

Swansea University Authors: Martin Bache, Richard Johnston
Published in International Journal of Fatigue (2012)

In collection: Faculty of Science and Engineering

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Book chapter

Organic Hard Masks Utilizing Fullerene Derivatives / Thomas I. Wallow, Christoph K. Hohle, Andreas Frommhold, Alan G. Brown, Tom Lada, et al

Swansea University Author: Richard Palmer
Published 2015

In collection: Faculty of Science and Engineering

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Journal article

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography / Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, et al

Swansea University Author: Richard Palmer
Published in Journal of Micro/Nanolithography, MEMS, and MOEMS (2013)

In collection: Faculty of Science and Engineering

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Journal article

Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching / Ying Zhang, A. Frommhold, R. E. Palmer, A. P. G. Robinson, Gottlieb S. Oehrlein, et al

Swansea University Author: Richard Palmer
Published 2013

In collection: Faculty of Science and Engineering

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Journal article

Low Activation Energy Fullerene Molecular Resist / Clifford L. Henderson, J. Manayam, M. Manickam, J. A. Preece, R. E. Palmer, et al

Swansea University Author: Richard Palmer
Published 2009

In collection: Faculty of Science and Engineering

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Journal article

Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker / H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2008)

In collection: Faculty of Science and Engineering

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Journal article

Chemically amplified molecular resists for e-beam lithography / F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2008)

In collection: Faculty of Science and Engineering

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Journal article

Chemical Amplification of a Triphenylene Molecular Electron Beam Resist / H. M. Zaid, A. P. G. Robinson, R. E. Palmer, M. Manickam, J. A. Preece

Swansea University Author: Richard Palmer
Published in Advanced Functional Materials (2007)

In collection: Faculty of Science and Engineering

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Journal article

A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution / T. Tada, T. Kanayama, A.P.G. Robinson, R.E. Palmer, M.T. Allen, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2000)

In collection: Faculty of Science and Engineering

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Journal article

Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography / A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, M. T. Allen, et al

Swansea University Author: Richard Palmer
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (2000)

In collection: Faculty of Science and Engineering

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Journal article

Exposure mechanism of fullerene derivative electron beam resists / A.P.G Robinson, R.E Palmer, T Tada, T Kanayama, E.J Shelley, et al

Swansea University Author: Richard Palmer
Published in Chemical Physics Letters (1999)

In collection: Faculty of Science and Engineering

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Journal article

Electron beam induced fragmentation of fullerene derivatives / A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, J.A. Preece, et al

Swansea University Author: Richard Palmer
Published in Chemical Physics Letters (1998)

In collection: Faculty of Science and Engineering

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Journal article

Beyond “yesterday’s tomorrow”: future-focused mobile interaction design by and for emergent users / Manjiri Joshi, Dani Raju, Charity Chao Mbogo, Sharon Wangari, Anirudha Joshi, et al

Swansea University Authors: Matt Jones, Simon Robinson, Jen Pearson
Published in Personal and Ubiquitous Computing (2017)

In collection: Faculty of Science and Engineering

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Journal article

Performance of a high resolution chemically amplified electron beam resist at various beam energies / D.X. Yang, A. Frommhold, A. McClelland, J. Roth, M. Rosamond, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2016)

In collection: Faculty of Science and Engineering

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Book chapter

Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography / Thomas I. Wallow, Christoph K. Hohle, Andreas Frommhold, Alexandra McClelland, Dongxu Yang, et al

Swansea University Author: Richard Palmer
Published 2015

In collection: Faculty of Science and Engineering

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Journal article

Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography / Thomas I. Wallow, Christoph K. Hohle, A. Frommhold, D. X. Yang, A. McClelland, et al

Swansea University Author: Richard Palmer
Published 2014

In collection: Faculty of Science and Engineering

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Journal article

Spin-on Carbon using Fullerene derivatives / Gottlieb S. Oehrlein, Qinghuang Lin, Ying Zhang, A. Frommhold, A. G. Brown, et al

Swansea University Author: Richard Palmer
Published 2014

In collection: Faculty of Science and Engineering

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Journal article

EUV lithography performance of negative-tone chemically amplified fullerene resist / Mark H. Somervell, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, et al

Swansea University Author: Richard Palmer
Published 2013

In collection: Faculty of Science and Engineering

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